Design for manufacture to deal with mask-induced critical dimension errors in the extreme ultraviolet (Journal Paper)
Authors: Yumi Nakajima, Takashi Sato, Ryoichi Inanami, et al.
Published: 01 Apr 2010
Mask-induced aberration in EUV lithography (Conference Proceedings)
Authors: Yumi Nakajima, Takashi Sato, Ryoichi Inanami, et al.
Published: 11 May 2009
Polar Correction: new overlay control method for higher-order intra-field error dependent on the wafer coordinates (Conference Proceedings)
Authors: Manabu Takakuwa, Keigo Toriumi, Nobuhiro Komine, et al.
Published: 23 Mar 2009
A study of filling process for UV nanoimprint lithography using a fluid simulation (Conference Proceedings)
Authors: Ikuo Yoneda, Yasutada Nakagawa, Shinji Mikami, et al.
Published: 17 Mar 2009
What is the strongest candidate in lithography for 2x nm HP and beyond? (Conference Proceedings)
Authors: Kohji Hashimoto, Ikuo Yoneda, Takeshi Koshiba, et al.
Published: 01 Dec 2008
