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Dr. Tatsuhiko Higashiki
Toshiba Corp
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PUBLICATIONS Most recent | Show all | Design for manufacture to deal with mask-induced critical dimension errors in the extreme ultraviolet (Journal Paper)
Authors: Yumi Nakajima, Takashi Sato, Ryoichi Inanami, et al.
Published: 01 Apr 2010
Mask-induced aberration in EUV lithography (Conference Proceedings)
Authors: Yumi Nakajima, Takashi Sato, Ryoichi Inanami, et al.
Published: 11 May 2009
Polar Correction: new overlay control method for higher-order intra-field error dependent on the wafer coordinates (Conference Proceedings)
Authors: Manabu Takakuwa, Keigo Toriumi, Nobuhiro Komine, et al.
Published: 23 Mar 2009
A study of filling process for UV nanoimprint lithography using a fluid simulation (Conference Proceedings)
Authors: Ikuo Yoneda, Yasutada Nakagawa, Shinji Mikami, et al.
Published: 17 Mar 2009
What is the strongest candidate in lithography for 2x nm HP and beyond? (Conference Proceedings)
Authors: Kohji Hashimoto, Ikuo Yoneda, Takeshi Koshiba, et al.
Published: 01 Dec 2008
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CONFERENCE COMMITTEE INVOLVEMENT Most recent | Show all | Alternative Lithographic Technologies III
27 February - 3 March 2011
San Jose, California, USA
Alternative Lithographic Technologies II
21 - 25 February 2010
San Jose, California, USA
Optical Microlithography XXIII
21 - 25 February 2010
San Jose, California, USA
Optical Microlithography XXII
22 - 27 February 2009
San Jose, CA, USA
Alternative Lithographic Technologies
22 - 27 February 2009
San Jose, CA, USA
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